Fluorocarbon-based single-layer resist for 157-nm lithography | InnScience

Help improve InnScience

Optional analytics record pages and research actions with an opaque visitor ID. We do not store raw IP addresses or infer your identity.

DataScope TechLink (Beta)Community

Loading...

Loading papers...

InnScience Labs Inc.

4551 Zimmerman Ave
Niagara Falls, ON L2E 3M5
Canada

Contact

team@innscience.ca +1 289-272-4719 LinkedIn

Quick Links

Pricing Privacy Policy Terms of Use

© 2026 InnScience Labs Inc. All rights reserved.

Made withfor scientific innovation

Fluorocarbon-based single-layer resist for 157-nm lithography | InnScience